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Step 08 Metrology & QC

Atomic Force Microscope

Manufacturer: MEDIUM ● Required for sub-nm roughness QC and publication-quality surface data; not on critical path for initial chip testing (optical tests can proceed without it)

Role in QLT Fabrication

Why Surface Roughness Matters for Quantum Photonics

The AFM provides 3D topographic imaging at sub-nanometer vertical resolution ● the ONLY tool that can directly measure waveguide surface roughness at the level that affects optical propagation loss. For QLT's room-temperature quantum photonic chip, surface roughness is the dominant loss mechanism.

Waveguide scattering loss is dominated by sidewall and surface roughness:

SCATTERING LOSS EQUATION:

α_scatter ∝ (σ² / λ²) × (n₁² - n₂²)²

where:
σ  = RMS surface roughness
λ  = operating wavelength (1550 nm)
n₁ = core refractive index (SiN = 1.99)
n₂ = cladding refractive index (SiO₂ = 1.45)

Numerical impact for SiN waveguides at 1550 nm:

σ = 0.1 nm → loss ≈ 0.05 dB/cm  (state-of-the-art)
σ = 0.3 nm → loss ≈ 0.5 dB/cm   (LIGENTEC spec ● our target)
σ = 0.5 nm → loss ≈ 1.4 dB/cm   (marginal for quantum applications)
σ = 1.0 nm → loss ≈ 5.0 dB/cm   (unacceptable ● 10× too high)

For quantum OPC at 1550 nm, we need propagation loss < 1 dB/cm
→ surface roughness MUST be < 0.5 nm RMS
→ the AFM is the ONLY instrument that can distinguish 0.3 nm from 0.5 nm

AFM vs. Other Metrology Tools

ParameterAFM (#14)Optical Profiler (#15)Stylus Profiler (#07)Ellipsometer (#16)
Vertical resolution0.01–0.1 nm< 0.1 nm< 0.1 nm0.1 nm (indirect)
Lateral resolution1–10 nm0.38 μm (diffraction-limited)~1 μm (stylus tip)~1 mm (spot size)
Surface roughness (RMS)✅ Direct (Sa, Sq)✅ Areal (Sa, Sq)✅ Line only (Ra, Rq)
3D topography✅ (atomic resolution)✅ (optical resolution)❌ (2D line scan)
Film thicknessVia step heightVia step height✅ (fastest)✅ (fastest, non-contact)
Scan speedSlow (5–30 min/image)Fast (5 sec)Fast (30 sec)Fast (10 sec)
Scan area15–100 μm maxmm-scalemm-scalemm-scale
ContactSemi-contact (tapping)Non-contactContact (diamond)Non-contact

Conclusion: AFM is irreplaceable for sub-nm roughness QC. The optical profilometer (#15) handles routine roughness screening; the AFM provides definitive measurements and arbitrates when results are borderline.

Specific Measurements for QLT

MeasurementSampleTarget ValueToleranceProcess Step
SiN waveguide top surface roughnessIncoming chipSa < 0.3 nm RMSAbsoluteIncoming QC from LIGENTEC (A1)
SiN waveguide sidewall roughnessIncoming chip (cleaved)Sa < 0.5 nm RMSAbsoluteIncoming QC
SiO₂ cladding roughness post-etchAfter ICP-RIESa < 1.0 nm RMS< 2 nmB2 QC gate
As₂S₃ film roughnessAfter evaporationSa < 0.5 nm RMS< 1 nmG3 QC gate
As₂S₃ grain morphologyAfter evaporationAmorphous (no grains)VisualG3 QC gate
Au pad surface qualityAfter metallizationSa < 5 nm RMS< 10 nmB5 QC gate
PVDF-TrFE film roughnessAfter spin-coat + annealSa < 3 nm RMS< 5 nmB4 QC gate
Waveguide height (cross-section)Incoming chip800 nm ± 10 nm± 20 nmIncoming QC
Etch depth verificationAfter ICP-RIE3.3 μm± 0.1 μmB2 QC gate

AFM in the QLT Metrology Hierarchy

ROUGHNESS MEASUREMENT DECISION TREE:

START: Need roughness measurement
│
├── Routine screening (Sa > 1 nm expected)?
│   └── Use OPTICAL PROFILER (#15) ● fast, non-contact, 3D areal
│
├── Quantum-grade roughness (Sa < 1 nm target)?
│   └── Use AFM (#14) ● definitive sub-nm measurement
│
├── Soft film (As₂S₃, PVDF-TrFE)?
│   ├── Screening → OPTICAL PROFILER (#15) ● zero contact risk
│   └── Definitive → AFM (#14) in tapping mode (minimal force)
│
├── Step height measurement?
│   ├── Primary → STYLUS PROFILOMETER (#07) ● absolute reference
│   └── Cross-check → OPTICAL PROFILER (#15) or AFM (#14)
│
└── Refractive index + thickness?
└── ELLIPSOMETER (#16) ● only tool for n,k measurement

Recommended Configuration

ParameterSpecification
ManufacturerAFM Workshop, Signal Hill, CA
ModelTT-2 (Table-Top AFM)
Scanner typeClosed-loop piezo (modified tripod design with strain gauge sensors)
Scanner options15 × 15 × 7 μm (high-res), 50 × 50 × 17 μm (standard), 100 × 100 × 17 μm (large-area)
Z noise floor< 80 pm (15 μm scanner, vibration-free); < 150 pm (50/100 μm scanners)
Z feedback noise< 0.1 nm (15 μm scanner); < 0.2 nm (50/100 μm scanners)
XY resolution0.003 nm (15 μm scanner); 0.005 nm (50 μm); 0.010 nm (100 μm)
Z resolution0.0015 nm (15 μm scanner); 0.003 nm (50/100 μm scanners)
XY linearity< 0.1% (closed-loop strain gauge)
Imaging modesVibrating (tapping), Non-vibrating (contact), Phase, Lateral Force (LFM), Force/Distance
Optional modesConductive AFM, magnetic force, electric force
Sample sizeUp to 25 × 25 × 19 mm (1" × 1" × ¾")
Probe accessible area25 × 25 mm
Optical alignmentResearch-grade video microscope (7:1 zoom, 45×–400× magnification, 2 μm resolution, 5 MP CMOS camera)
Image resolutionUp to 1024 × 1024 pixels
ElectronicsNational Instruments USB DAQ; 24-bit DAC
SoftwareLabVIEW-based; Gwyddion-compatible; standard AFM file formats
Stage footprint~100 × 180 mm (compact benchtop)
PowerStandard 120V outlet; ~50 W total
WeightStage: ~5 kg; Controller (Ebox): ~5 kg; Total: ~10 kg
Price (2026)$41,587–$84,357 (configuration-dependent, per AFM Workshop website)
Delivery2–4 weeks (US-manufactured)
MeasurementSampleTarget ValueToleranceProcess Step
SiN waveguide top surface roughnessIncoming chipSa < 0.3 nm RMSAbsoluteIncoming QC from LIGENTEC (A1)
SiN waveguide sidewall roughnessIncoming chip (cleaved)Sa < 0.5 nm RMSAbsoluteIncoming QC
SiO₂ cladding roughness post-etchAfter ICP-RIESa < 1.0 nm RMS< 2 nmB2 QC gate
As₂S₃ film roughnessAfter evaporationSa < 0.5 nm RMS< 1 nmG3 QC gate
As₂S₃ grain morphologyAfter evaporationAmorphous (no grains)VisualG3 QC gate
Au pad surface qualityAfter metallizationSa < 5 nm RMS< 10 nmB5 QC gate
PVDF-TrFE film roughnessAfter spin-coat + annealSa < 3 nm RMS< 5 nmB4 QC gate
Waveguide height (cross-section)Incoming chip800 nm ± 10 nm± 20 nmIncoming QC
Etch depth verificationAfter ICP-RIE3.3 μm± 0.1 μmB2 QC gate
ParameterSpecification
ManufacturerAFM Workshop, Signal Hill, CA
ModelTT-2 (Table-Top AFM)
Scanner typeClosed-loop piezo (modified tripod design with strain gauge sensors)
Scanner options15 × 15 × 7 μm (high-res), 50 × 50 × 17 μm (standard), 100 × 100 × 17 μm (large-area)
Z noise floor< 80 pm (15 μm scanner, vibration-free); < 150 pm (50/100 μm scanners)
Z feedback noise< 0.1 nm (15 μm scanner); < 0.2 nm (50/100 μm scanners)
XY resolution0.003 nm (15 μm scanner); 0.005 nm (50 μm); 0.010 nm (100 μm)
Z resolution0.0015 nm (15 μm scanner); 0.003 nm (50/100 μm scanners)
XY linearity< 0.1% (closed-loop strain gauge)
Imaging modesVibrating (tapping), Non-vibrating (contact), Phase, Lateral Force (LFM), Force/Distance
Optional modesConductive AFM, magnetic force, electric force
Sample sizeUp to 25 × 25 × 19 mm (1" × 1" × ¾")
Probe accessible area25 × 25 mm
Optical alignmentResearch-grade video microscope (7:1 zoom, 45×–400× magnification, 2 μm resolution, 5 MP CMOS camera)
Image resolutionUp to 1024 × 1024 pixels
ElectronicsNational Instruments USB DAQ; 24-bit DAC
SoftwareLabVIEW-based; Gwyddion-compatible; standard AFM file formats
Stage footprint~100 × 180 mm (compact benchtop)
PowerStandard 120V outlet; ~50 W total
WeightStage: ~5 kg; Controller (Ebox): ~5 kg; Total: ~10 kg
Price (2026)$41,587–$84,357 (configuration-dependent, per AFM Workshop website)
Delivery2–4 weeks (US-manufactured)
ModelManufacturerZ NoiseScan RangeAutomationPrice (New)Lead Time
AFM Workshop TT-2AFM Workshop (CA)< 80 pmUp to 100 × 100 μmManual$42,000–$84,0002–4 weeks
Nanosurf CoreAFMNanosurf (Switzerland)< 100 pmUp to 110 × 110 μmCompact; modular$25,000–$50,0003–6 weeks
Nanosurf FlexAFMNanosurf (Switzerland)< 60 pmUp to 100 × 100 μmModular; AFM-Raman$40,000–$80,0004–8 weeks
Bruker MultiMode 8Bruker (CA)< 30 pmUp to 125 × 125 μmSemi-auto$80,000–$150,0006–12 weeks
Bruker Dimension IconBruker (CA)< 30 pmUp to 90 × 90 μmFull auto; 200 mm wafer$150,000–$300,0008–16 weeks
Park NX10Park Systems (Korea)< 30 pmUp to 100 × 100 μmSemi-auto; true non-contact$120,000–$250,0008–14 weeks
Oxford Asylum MFP-3DOxford Instruments (UK)< 25 pmUp to 90 × 90 μmSemi-auto$100,000–$200,0008–12 weeks

Process Integration

System Setup and First Scan

STARTUP PROCEDURE (AFM Workshop TT-2):

STEP 1:  Power on controller (Ebox) and PC
STEP 2:  Launch AFM software
STEP 3:  Mount probe (tapping mode silicon cantilever)
├── Place probe chip in probe holder using tweezers
├── Secure with spring clip
└── Insert holder into AFM stage
STEP 4:  Align laser on cantilever using video microscope
├── View cantilever through microscope
├── Adjust laser XY position until beam is centered on cantilever tip
└── Adjust detector position to center the reflected beam
STEP 5:  Mount sample
├── Affix sample to magnetic sample puck using double-sided tape
├── Place puck on magnetic stage
└── Navigate to area of interest using video microscope
STEP 6:  Frequency tune (tapping mode)
├── Software sweeps frequency to find cantilever resonance (~300 kHz typical)
├── Set drive amplitude to achieve ~80% free amplitude
└── Set setpoint to ~70% of free amplitude (gentle tapping)
STEP 7:  Approach
├── Use coarse approach (motorized) to bring probe within ~100 μm of surface
├── Initiate automated approach → probe engages surface
└── Verify stable feedback signal
STEP 8:  Scan
├── Set scan parameters (area, speed, resolution)
├── Start scan → image builds line by line
└── Monitor real-time for artifacts (probe tip contamination, feedback instability)
STEP 9:  Save and analyze
├── Save raw image data
├── Open in Gwyddion for quantitative analysis
└── Export roughness values and images for QC report

Total setup time (first scan of session): ~30 minutes
Subsequent scans: ~15-20 minutes each (probe already aligned)

Calibration Procedures

WEEKLY Z-AXIS CALIBRATION:

1. Mount NIST-traceable step-height standard (e.g., 100 nm step)
2. Scan across step edge in tapping mode
3. Measure step height in analysis software
4. Expected: 100 ± 2 nm
5. If > 2 nm deviation: adjust Z calibration coefficient in software
6. Log result

WEEKLY ROUGHNESS BASELINE:

1. Cleave fresh muscovite mica sheet
2. Mount on sample puck
3. Scan 2 × 2 μm area in tapping mode
4. Calculate Sq roughness → should be < 0.1 nm (atomically flat)
5. If Sq > 0.15 nm: probe tip is contaminated or damaged → replace probe
6. Log result

MONTHLY XY CALIBRATION:

1. Mount calibration grid (e.g., 10 μm pitch, 100 nm deep)
2. Scan 50 × 50 μm area
3. Verify grid pitch measures 10.0 ± 0.1 μm
4. If > 1% deviation: adjust XY calibration coefficients
5. Log result

Vendor Options & Pricing

New System Cost ● AFM Workshop TT-2 Configurations

ConfigurationIncludesPrice (2026)
TT-2 Base (50 μm scanner)Stage + Ebox + software + video microscope + 10 probes~$48,000
TT-2 + 15 μm scanner (add)Highest resolution for sub-nm roughness+$4,000–$5,400
TT-2 + 100 μm scanner (add)Large-area scanning+$4,000–$5,400
TT-2 + acoustic enclosureReduces ambient noise; critical for sub-nm measurement+$3,000–$5,000
TT-2 + vibration isolation tablePneumatic (Thorlabs PTH602) or passive (Minus-K BM-1)+$3,000–$8,000
TT-2 + conductive AFM optionFor electrical characterization+$5,000–$10,000
Recommended QLT configTT-2 + 50 μm scanner + acoustic enclosure + isolation table~$58,000

Used/Refurbished Market

ModelUsed PriceLead TimeNotes
Bruker Dimension 3100 / Veeco DI$10,000–$25,0002–4 weeksVery common; excellent for roughness
Bruker MultiMode V$15,000–$30,0002–4 weeksGood research tool
Veeco Innova$8,000–$18,0002–4 weeksAdequate for basic topography
Park XE-70$15,000–$30,0003–6 weeksGood if found
Digital Instruments NanoScope IIIa$5,000–$12,0001–3 weeksVery old but functional

Used market sources: LabX (labx.com), Used-Line (used-line.com), Capovani Brothers, eBay (for educational units)

Our Budget Recommendation

NEW (fastest delivery, best value for QLT):

  • AFM Workshop TT-2 (50 μm scanner + acoustic enclosure): ~$53,000
  • Add vibration isolation table: ~$5,000
  • Total: ~$58,000; lead time 2–4 weeks
  • US-made (Signal Hill, CA); excellent technical support; fast delivery
  • Z noise < 150 pm ● adequate for all QLT surface roughness measurements

REFURBISHED (budget):

  • Bruker Dimension 3100 (refurb): $18,000–$25,000
  • Add isolation table + enclosure: ~$8,000
  • Total: ~$31,000; lead time 2–4 weeks
  • Excellent used market availability; NanoScope software well-documented
  • May need scanner recalibration ($2,000 service)

Facility Requirements

Vibration ● THE CRITICAL REQUIREMENT

ParameterSpecification
Vibration sensitivityMOST VIBRATION-SENSITIVE INSTRUMENT IN THE LAB
Vibration budget< 0.5 μm/s amplitude (0.1–100 Hz band)
Isolation table typePneumatic (active) or negative-stiffness (passive, e.g., Minus-K)
Isolation table cost$3,000–$8,000
Floor typeGround-floor concrete slab STRONGLY preferred
Upper-floor penaltyBuilding vibrations degrade images; may need active isolation
Separation from pumps≥ 3 m from roughing pumps, turbopumps, HVAC ducts
Separation from foot traffic≥ 2 m from walkways
Time of dayBest images after-hours (less building vibration)

Acoustic Environment

ParameterSpecification
Acoustic enclosureHighly recommended ● improves noise floor by 5–10×
Enclosure typeFoam-lined acrylic box or commercial acoustic hood
Enclosure cost$2,000–$5,000 (AFM Workshop offers compatible model)
Ambient noise< 45 dB(A) measured at AFM location
Sources to avoidHVAC blowers, fume hoods, conversations near AFM

Environment

ParameterOperating RangeOptimal
Temperature15–35°C22 ± 1°C (thermal drift affects long scans)
Humidity20–80% RH30–50% RH (condensation causes adhesion artifacts)
LightingDim preferredCan operate in dark
EMI< 1 GaussAvoid strong magnetic fields
ElectricalStandard 120V outlets × 2 (AFM + PC)No special power required

Safety & Handling

HazardRisk LevelMitigation
AFM probe tips (sharp, nanoscale)LOWHandle with tweezers only; do not touch tip
Laser (used for cantilever detection)LOW (Class 1 ● enclosed)No eye hazard during normal operation
Sample handling (semiconductor chips)LOWESD precautions; clean handling
As₂S₃ samples (arsenic-containing)LOW (solid form)Wear gloves when handling
Vibration isolation table (compressed air for pneumatic)LOWStandard lab air supply if pneumatic type
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