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Step 06 Dicing / Fiber Attach / Packaging

Advanced Packaging Station

Flip-chip bonding, through-silicon vias (TSVs), and 2.5D interposer integration for multi-chip quantum processor modules. Phase 3 scale-up capability for heterogeneous chiplet architectures.

ASM Pacific ASMPT / Besi MEDIUM ● Phase 3 advanced packaging for multi-chip quantum processor modules

Role in QLT Fabrication

As QLT's quantum photonic processor scales beyond the initial 8-mode single-die architecture, advanced packaging becomes essential for integrating multiple heterogeneous chiplets — photonic mesh dies, SPAD detector arrays, TDC readout ASICs, and control electronics — into a single multi-chip module (MCM). Traditional wire bonding suffices for v1 prototypes, but Phase 3 production demands flip-chip bonding with sub-micron alignment accuracy, through-silicon vias for vertical electrical interconnect, and silicon or glass interposers for 2.5D co-integration.

The advanced packaging station replaces long wire-bond paths (which add parasitic inductance and limit bandwidth) with short solder-bump interconnects that can handle the >1 GHz signaling rates required for real-time herald-to-switch feedback loops. This is a Phase 3 investment — the v1/v2 prototypes use conventional wire bonding and separate PCB assemblies.

  • Flip-chip bonding ● sub-5 μm placement accuracy for photonic die-to-interposer alignment
  • TSV integration ● vertical electrical paths through silicon interposer eliminate wire bonds
  • 2.5D interposer ● co-locates photonic die, SPAD array, and TDC ASIC within 1 mm
  • Thermal management ● copper pillar bumps provide direct thermal path to heat spreader
  • Signal integrity ● bump pitch < 100 μm enables >10 GHz electrical bandwidth
  • Scalability ● enables 16-mode and 32-mode multi-die processor assemblies

Why Advanced Packaging for Quantum Photonics?

ParameterWire Bond (v1)Flip-Chip (Phase 3)Improvement
Interconnect length1–5 mm30–100 μm50–100× shorter
Parasitic inductance~1 nH per bond< 0.05 nH per bump20× lower
Bandwidth (electrical)< 2 GHz> 10 GHz5× higher
I/O density~50 pads/die edge> 10,000 bumps/cm²100× denser
Thermal resistance~15 K/W (through PCB)< 3 K/W (Cu pillars)5× better
Assembly footprint~40 × 40 mm MCM< 15 × 15 mm MCM7× smaller

Technical Specifications

Flip-Chip Bonder — Primary Tool

ParameterSpecification
ProcessThermocompression (TC) and mass-reflow flip-chip bonding
Placement accuracy±1.5 μm @ 3σ (post-bond)
Bond force range1–100 N programmable
Temperature rangeRT–450°C (bondhead and substrate)
Substrate sizeUp to 300 mm wafer or 100 × 100 mm panel
Die size range0.5 × 0.5 mm to 25 × 25 mm
Bump types supportedSolder (SnAg, AuSn), Cu pillar, Au stud, In bumps
Bump pitchDown to 40 μm (production); 20 μm (R&D mode)
Vision systemDual-camera split-optics with pattern recognition
Throughput200–600 UPH (depending on process)
Bond-head travelX/Y/Z/θ with piezo fine-alignment
Atmosphere controlN₂ or forming gas (N₂/H₂) for oxide-free bonding

2.5D Interposer Architecture for QLT

QLT MULTI-CHIP MODULE (Phase 3 Architecture):

┌─────────────────────────────────────────────────────┐
│                   Kovar Package Lid                  │
├─────────────────────────────────────────────────────┤
│                                                     │
│   ┌──────────┐  ┌──────────┐  ┌──────────────┐     │
│   │ PHOTONIC  │  │ SPAD     │  │ TDC ASIC     │     │
│   │ MESH DIE  │  │ ARRAY    │  │ (PACIFIC-2)  │     │
│   │ 5×5 mm   │  │ 2×2 mm  │  │ 3×3 mm      │     │
│   └────┬─────┘  └────┬─────┘  └──────┬───────┘     │
│        │bump          │bump           │bump         │
│   ═════╪══════════════╪═══════════════╪═══════      │
│   │         SILICON INTERPOSER (15×15 mm)      │    │
│   │    TSVs + RDL (redistribution layer)       │    │
│   │    Fine-pitch wiring: 2 μm L/S             │    │
│   ═════════════════════════════════════════════      │
│        │C4 bumps                                    │
│   ┌────┴────────────────────────────────────┐       │
│   │     ORGANIC SUBSTRATE (BGA)              │       │
│   │     0.8 mm core, 6-layer buildup         │       │
│   └──────────────────────────────────────────┘       │
│        │BGA balls                                   │
├─────────────────────────────────────────────────────┤
│              AlN Sub-mount / Heat Spreader           │
└─────────────────────────────────────────────────────┘

KEY ADVANTAGES:
├── Photonic ↔ SPAD optical path: < 2 mm (on-interposer waveguide)
├── SPAD → TDC electrical path: < 500 μm (interposer RDL)
├── Herald latency reduction: 11.2 ns → < 5 ns (shorter paths)
├── Thermal: all dies share common heat sink via Cu TSVs
└── I/O: 500+ connections between dies (impossible with wire bond)

Through-Silicon Via (TSV) Specifications

ParameterSpecification
TSV diameter5–10 μm (via-middle process)
TSV depth50–100 μm (after wafer thinning)
Aspect ratio5:1 to 10:1
Fill materialElectroplated Cu with TiN barrier + SiO₂ liner
Resistance per TSV< 50 mΩ
Capacitance per TSV< 30 fF
Current capacity> 100 mA per TSV (electromigration limited)
TSV pitch20–50 μm (matching micro-bump pitch)
Interposer waferSi, 300 mm, thinned to 100 μm

Process Integration

QLT ADVANCED PACKAGING FLOW (Phase 3):

PRE-REQUISITES:
├── Photonic die: tested, diced, known-good-die (KGD)
├── SPAD array die: KGD, bumped with In or AuSn
├── TDC ASIC: KGD, Cu pillar bumped (40 μm pitch)
├── Silicon interposer: TSV-processed, RDL patterned, bumped
└── All dies have fiducial alignment marks

STEP 1: Interposer Preparation
├── Inspect interposer under automated optical inspection (AOI)
├── Verify TSV continuity (4-wire probe, sample basis)
├── Apply flux or no-clean paste to micro-bump pads
└── Mount interposer on bonding chuck (vacuum hold)

STEP 2: Photonic Die Placement (Critical Alignment)
├── Pick photonic die from waffle tray
├── Dual-camera alignment: top fiducials + bottom fiducials
├── Place at ±1.5 μm accuracy onto interposer
├── Thermocompression bond: 300°C, 20 N, 10 s
└── Optical alignment CRITICAL: waveguide ↔ interposer coupler

STEP 3: SPAD Array Placement
├── Pick SPAD die from gel-pack
├── Align to interposer optical I/O pads
├── Bond: AuSn reflow at 310°C or In cold-weld at 150°C
└── In bumps preferred (lower temp protects photonic die)

STEP 4: TDC ASIC Placement
├── Pick TDC ASIC (PACIFIC-2) from waffle tray
├── Standard electrical alignment (less critical than photonic)
├── Thermocompression bond: 280°C, 15 N, 8 s
└── Cu pillar + SnAg cap reflow

STEP 5: Underfill Dispense
├── Capillary underfill (Namics U8443-14) between each die pair
├── Cure: 150°C × 30 min
├── Protects bumps from thermal cycling stress
└── CTE-matched filler for reliability

STEP 6: Interposer-to-Substrate Attach
├── C4 solder balls on interposer backside
├── Mass reflow onto organic BGA substrate
├── Peak reflow: 260°C (Pb-free SAC305)
└── X-ray inspection for void content < 25%

STEP 7: Package-Level Assembly
├── Mount MCM substrate into Kovar package
├── Attach fiber arrays to photonic die edge couplers
├── Hermetic seal (seam weld per hermetic-packaging process)
└── Final electrical + optical test

Vendor Options & Pricing

Flip-Chip Bonder Systems

SystemVendorAccuracyPrice RangeLead Time
ASMPT AD862ASM Pacific (ASMPT)±1.5 μm @ 3σ$800,000–$1,200,00016–24 weeks
Besi Datacon 8800Besi (Netherlands)±1.0 μm @ 3σ$600,000–$1,000,00014–20 weeks
Kulicke & Soffa APAMAK&S (Singapore)±2.0 μm @ 3σ$500,000–$800,00012–18 weeks
Shibaura CBA-1000Shibaura Mechatronics±1.5 μm @ 3σ$400,000–$700,00014–20 weeks
Finetech FINEPLACER femto 2Finetech (Germany)±0.5 μm$300,000–$500,00010–16 weeks
SET FC150SET (France)±1.0 μm$350,000–$600,00012–18 weeks

Supporting Equipment

EquipmentFunctionPrice Range
Underfill dispenser (Nordson Asymtek)Capillary underfill application$80,000–$150,000
Reflow oven (BTU Pyramax)Mass reflow for BGA attach$100,000–$200,000
X-ray inspection (Nordson Dage)Solder joint / void inspection$200,000–$400,000
Wafer bumping line (outsource)UBM + solder or Cu pillar deposition$50–$200/wafer (outsource)
Plasma cleaner (Nordson March)Pre-bond surface activation$30,000–$60,000

Total System Budget

PHASE 3 ADVANCED PACKAGING LINE:

Core flip-chip bonder:          $600,000–$1,200,000
Underfill dispenser:            $80,000–$150,000
Reflow oven:                    $100,000–$200,000
X-ray inspection:               $200,000–$400,000
Plasma cleaner:                 $30,000–$60,000
Interposer procurement:         $200–$500/unit (outsource TSV)
Installation & qualification:   $50,000–$100,000
═══════════════════════════════════════════
ESTIMATED TOTAL: $2,000,000–$3,000,000
═══════════════════════════════════════════

ALTERNATIVE: Outsource to OSAT
├── Amkor Technology (Tempe, AZ)
├── ASE Group (Taiwan)
├── JCET (China)
├── Cost: $500–$2,000/MCM (depending on complexity)
├── NRE: $50,000–$200,000 (mask set + qualification)
└── Recommended for < 1,000 units/year

Facility Requirements

ParameterSpecification
Cleanroom classISO 5 (Class 100) — required for exposed bump surfaces
Power3-phase 208V/30A (bonder); 3-phase 480V/60A (reflow oven)
Compressed gasN₂ (99.999%) at 80 PSI; forming gas (N₂/H₂ 95/5)
Floor space30–50 m² (full line including support equipment)
Vibration isolationRequired — active vibration table for < 2 μm bonder
Temperature22 ± 1°C (bonder requires tight thermal control)
Humidity40 ± 10% RH (non-condensing)
ExhaustLocal extraction for flux fumes during reflow
DI water> 15 MΩ·cm (for flux cleaning if water-soluble flux used)

Safety & Handling

HazardSourceRisk LevelControls
Hot surfaces (450°C bondhead)Thermocompression bondingHIGHInterlocked enclosure; cool-down cycle before access
Forming gas (H₂ content)N₂/H₂ reflow atmosphereMEDIUMH₂ < 5% (non-flammable); LEL monitor; ventilation
Lead-free solder fumesReflow ovenLOWLocal extraction; HEPA filtration
ESD damage to diesHandling bare diesHIGHESD wrist straps; ionized air; conductive work surfaces
X-ray radiationInspection systemLOWFully enclosed; lead shielding; interlocked door
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